School Of Chem & Bioprocess Engineering
Tel: +353 1 7161724
Ian graduated from Dublin City University (DCU), in 2003 with a B.Eng. in Electronic Engineering. In 2007 he graduated with a PhD in Physics from DCU with a thesis entitled Spectroscopic characterisation of novel materials for semiconductor device applications. This research programme involved the characterisation of the electronic and chemical structure of low dielectric constant materials and organic semiconductors. The project formed part of a large research activity in DCU which developed control mechanisms for plasma etching and established a correlation between plasma parameters and surface chemistry. Ian then spent 1.5 years in Analog Devices where he worked as a Product Analysis Engineer. Ian is currently the Research Manager for the newly formed UCD Nano Imaging and Material Analysis Centre (NIMAC) in the School of Chemical and Bioprocess Engineering.
Honours and Awards
| Year: 2006.
Title: Shannon Fellowship to Boston University (BU)
| Year: 2003.
Title: NCPST - Final year undergraduate project prize
Peer Reviewed Journals
|I. Reid, Y. Zhang, A. DeMasi, G. Hughes and K. E. Smith.; (2008) 'Electronic structure characterization of Ultra Low-k (ULK) Carbon Doped Oxide (CDO) using soft X-ray emission spectroscopy'. Thin Solid Films, 516 (1). [Details]|
|A. DeMasi, L.F.J. Piper, Y. Zhang, I. Reid, S. Wang, K.E. Smith, J.E. Downes, N. Peltekis, C. McGuinness and A. Matsuura ; (2008) 'Electronic Structure of the Organic Semiconductor Alq3 (aluminum tris-8-hydroxyquinoline) from Soft X-ray Spectroscopies and Density Functional Theory Calculations'. Journal of Materials Chemistry, 129 (22). [Details]|
|Y. Zhang, S. Wang, A Demasi, I Reid, L. F. J. Piper, Y. Matsuura, J. E. Downes and K. E. Smith; (2008) 'Soft X-ray spectroscopy study of electronic structure in the organic semiconductor titanyl phthalocyanine (TiO-Pc)'. Journal of Materials Chemistry, 18 (1). [Details]|
|Reid, I, Hughes, G, ; (2007) 'Investigation of varying C4F8/O-2 gas ratios on the plasma etching of carbon doped ultra-low-k dielectric layers'. SEMICOND SCI TECH, 22 :636-640. [Details]|
|I. Reid and G. Hughes; (2006) 'Influence of plasma parameters on the chemical composition of steady-state fluorocarbon films deposited on carbon-doped low-k dielectric layers during etching'. Semiconductor Science and Technology, 21 (9). [Details]|
|I. Reid , V. Krastev and G. Hughes ; (2006) 'Suppression of carbon depletion from carbon-doped low-k dielectric layers during fluorocarbon based plasma etching'. Microelectronic Engineering, 83 (11). [Details]|
|G. Natarajana, S. Daniels, D. C. Cameron, L. O¿Reilly, A. Mitra, P. J. McNally, O. F. Lucas, R. T. Rajendra Kumar, I. Reid, A. L. Bradley; (2006) 'Growth of CuCl thin films by magnetron sputtering for ultraviolet optoelectronic applications'. Journal of Applied Physics, 100 (1). [Details]|
|M. Rahman, I. Reid, P. Duggan, D.P. Dowling, G. Hughes, M.S.J. Hashmi; (2006) 'Structural and tribological properties of the plasma nitrided Ti-alloy biomaterials: Influence of the treatment temperature'. Surface and Coatings Technology, 201 (9). [Details]|
|V. Krastev, I. Reid, C. Galassi, G. Hughes, E. McGlynn; (2005) 'Influence of C4F8/Ar/O2 plasma etching on SiO2 surface chemistry'. Journal of Materials Science-Materials in Electronics, 16 (8). [Details]|
|J. R. Ducle¿re, R. O¿Haire, A. Meaney, K. Johnston, I. Reid, G. Tobin, J. P. Mosnier, M. Guilloux-Viry, E. McGlynn, M.O. Henry; (2005) 'Fabrication of p-type doped ZnO thin films using pulsed laser deposition'. Journal of Materials Science-Materials in Electronics, 16 (7). [Details]|
His scientific interests are based in the development and operation of state-of-the-art analytical technique. Investigations into the chemical and electronic structure of materials are also of interest
Surface science techniques:
Bulk Characterisation techniques:
Thin film characterisation techniques: